Plasmochemical Deposition of an Ultrathin (CFx)n Film

V. Kopustinskas; V. Grigaliunas; M. Andrulevicius; J. Margelevicius

Plasmochemical Deposition of an Ultrathin (CFx)n Film

Authors

V. Kopustinskas
V. Grigaliunas
M. Andrulevicius
J. Margelevicius

Abstract

We present ultrathin teflon-like (CFx)n antiadhesive polymer films, deposited on silicon an polyethylentereftalate (PETF) surfaces by CF4 and C3F8 microwave discharge. The film growth phenomenon was reached by changing F/C ratio of the monomer. X-ray photoelectron spectroscopy analysis shows that polymer film presents as -CF2-CF2- junctions. Increasing deposition time, fluorinated film on PETF become ultrathin teflon-like polymer film and surface energy decreases to 42 mJ/m2.

Published

1998-01-14

Issue

Vol. 14 No. 1 (1998)

Section

Articles

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How to Cite

Plasmochemical Deposition of an Ultrathin (CFx)n Film. (1998). Elektronika Ir Elektrotechnika, 14(1). https://eejournal.ktu.lt/index.php/elt/article/view/15946