Thermal Oxidation in LOCOS, PBL and SWAMI Micro and Nano Structures

Authors

  • D. Andriukaitis Kaunas University of Technology
  • R. Anilionis Kaunas University of Technology

Abstract

Problems of thermal oxidation, related with LOCOS, PBL and SWAMI technologies wуку researched. The stresses, which appear during thermal oxidation are analysed in micro and nano scales levels in mentioned technologies. Thermal oxidation process is simulated with ATHENA. The Deal-Grove model is used for the oxide growth kinetics. Both in micro and nano scale structures stress created in SWAMI is less than in PBL and LOCOS. Maximum stress created in LOCOS is greater than in SWAMI, but less than PBL. Using thermal oxidation in nano scale created stresses are greater than in micro scale structures. Ill. 8, bibl. 7 (in English; summaries in English, Russian and Lithuanian).

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Published

2007-03-19

How to Cite

Andriukaitis, D., & Anilionis, R. (2007). Thermal Oxidation in LOCOS, PBL and SWAMI Micro and Nano Structures. Elektronika Ir Elektrotechnika, 75(3), 23-26. Retrieved from https://eejournal.ktu.lt/index.php/elt/article/view/10465

Issue

Vol. 75 No. 3 (2007)

Section

T 171 MICROELECTRONICS

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