The Influence of Activation Processes on Ion Sputtering

Authors

  • L. L. Pranevicius
  • D. Milcius
  • L. Pranevicius

Abstract

The role of activated surface atoms on the kinetics of heterogeneous processes in plasma is considered. The kinetics of the surface composition is studied including processes of preferential sputtering, thermal activated desorption and generation of activated atoms. The emphasis is made on the generation of multi-activated atoms. The mathematical formalism enabling to include these processes into the general scheme of ion beam induced processes is presented.

Published

1997-05-07

How to Cite

Pranevicius, L. L., Milcius, D., & Pranevicius, L. (1997). The Influence of Activation Processes on Ion Sputtering. Elektronika Ir Elektrotechnika, 11(2). Retrieved from https://eejournal.ktu.lt/index.php/elt/article/view/15836

Issue

Vol. 11 No. 2 (1997)

Section

Articles

License

The copyright for the paper in this journal is retained by the author(s) with the first publication right granted to the journal. The authors agree to the Creative Commons Attribution 4.0 (CC BY 4.0) agreement under which the paper in the Journal is licensed.

By virtue of their appearance in this open access journal, papers are free to use with proper attribution in educational and other non-commercial settings with an acknowledgement of the initial publication in the journal.