Control System of the Experimental Research of Deposition Process in Vacuum

Authors

  • V. Sinkevičius KTU Panevėžys Institute
  • D. Viržonis KTU Panevėžys Institute
  • L. Šumskienė KTU Panevėžys Institute
  • T. Jukna KTU Panevėžys Institute

Abstract

The control system for near-atomic thin films deposition is disclosed. The system is consisting of three parts: vapor pressure control, film conductivity control and stepwise coverage control. All three subsystems are explored experimentally and found to have the sufficient potential to give improved repeatability of deposition of near-atomic thin films. The results and conclusions from stepwise coverage experiments, followed by AFM and XPS analysis is presented as an evidence of direct relationship between the in-situ recorded voltage pattern and the film formation stages. Ill. 6, bibl. 10 (in English; abstracts in English, Russian and Lithuanian).

Downloads

Published

2007-05-20

How to Cite

Sinkevičius, V., Viržonis, D., Šumskienė, L., & Jukna, T. (2007). Control System of the Experimental Research of Deposition Process in Vacuum. Elektronika Ir Elektrotechnika, 77(5), 7-10. Retrieved from https://eejournal.ktu.lt/index.php/elt/article/view/10728

Issue

Vol. 77 No. 5 (2007)

Section

T 190 ELECTRICAL ENGINEERING

License

The copyright for the paper in this journal is retained by the author(s) with the first publication right granted to the journal. The authors agree to the Creative Commons Attribution 4.0 (CC BY 4.0) agreement under which the paper in the Journal is licensed.

By virtue of their appearance in this open access journal, papers are free to use with proper attribution in educational and other non-commercial settings with an acknowledgement of the initial publication in the journal.