Kopustinskas V, Grigaliunas V, Andrulevicius M, Margelevicius J. Plasmochemical Deposition of an Ultrathin (CFx)n Film. ELEKTRON ELEKTROTECH [Internet]. 1998Jan.14 [cited 2024May3];14(1). Available from: https://eejournal.ktu.lt/index.php/elt/article/view/15946