Grigaliunas, V., V. Kopustinskas, J. Margelevicius, and D. Eidukas. “Application of Al Mask for SF6/N2 Reactive Ion Etching of Silicon”. Elektronika ir Elektrotechnika 20, no. 2 (March 7, 1999). Accessed December 22, 2024. https://eejournal.ktu.lt/index.php/elt/article/view/16518.