V. Grigaliunas, V. Kopustinskas, J. Margelevicius, and D. Eidukas, “Application of Al Mask for SF6/N2 Reactive Ion Etching of Silicon”, ELEKTRON ELEKTROTECH, vol. 20, no. 2, Mar. 1999, Accessed: Feb. 07, 2026. [Online]. Available: https://eejournal.ktu.lt/index.php/elt/article/view/16518