Grigaliunas, V., Kopustinskas, V., Margelevicius, J. and Eidukas, D. (1999) “Application of Al Mask for SF6/N2 Reactive Ion Etching of Silicon”, Elektronika ir Elektrotechnika, 20(2). Available at: https://eejournal.ktu.lt/index.php/elt/article/view/16518 (Accessed: 28April2024).