ANDRIUKAITIS, D. Thermal Oxidation Process Influence to the V-MOS Structure. Elektronika ir Elektrotechnika, [S. l.], v. 98, n. 2, p. 45–48, 2010. DOI: 10.5755/j02.eie.9923. Disponível em: https://eejournal.ktu.lt/index.php/elt/article/view/9923.. Acesso em: 3 may. 2026.