Electrical field in insulating films grown by plasma deposition

Authors

  • L.L. Pranevicius
  • H. Gonnord
  • D. Milcius

Abstract

The insulating film grown in plasma is affected by charged particles arriving from plasma. The surface potential of the growing film depends on the film conductivity and the electrical field in film has to fulfill the conditions of current discontinuity. In the present work the electrical field in growing film is calculated in dependence on the film conductivity for DC and RF plasma.

Published

1998-08-29

How to Cite

Pranevicius, L., Gonnord, H., & Milcius, D. (1998). Electrical field in insulating films grown by plasma deposition. Elektronika Ir Elektrotechnika, 17(4). Retrieved from https://eejournal.ktu.lt/index.php/elt/article/view/16026

Issue

Vol. 17 No. 4 (1998)

Section

Articles

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